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high vacuum rf magnetron sputtering gun  (Kurt J Lesker)

 
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    Kurt J Lesker high vacuum rf magnetron sputtering gun
    High Vacuum Rf Magnetron Sputtering Gun, supplied by Kurt J Lesker, used in various techniques. Bioz Stars score: 90/100, based on 1 PubMed citations. ZERO BIAS - scores, article reviews, protocol conditions and more
    https://www.bioz.com/product/rf+magnetron+sputtering+system/high+vacuum+dc+magnetron+sputtering+system/10__1149_slash_2162___8777_slash_adc23e-32-25-22
    Average 90 stars, based on 1 article reviews
    high vacuum rf magnetron sputtering gun - by Bioz Stars, 2026-10
    90/100 stars

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    (a) Fabrication routes of hematite and AuNCs/α-Fe 2 O 3 photoanodes using radio frequency reactive magnetron <t>sputtering</t> and inert gas condensation techniques, (b) HR-STEM image of the AuNCs/α-Fe 2 O 3 thin film cross-section, (c) zoom-in Au nanograin with a measured d -spacing corresponding to the (111) plane, and (c) hematite grain with the measured d -spacing corresponding to the (2–11) plane (the insets show the corresponding FFT transformations).
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    Structures of the taste sensor. ( a ) Pt, Ag, SnO 2 , and Au layers were deposited on an alumina substrate by RF magnetron <t>sputtering;</t> ( b ) the sensor device was soldered onto the printed circuit board and covered by epoxy resin except for the sensing area.
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    Image Search Results


    (a) Fabrication routes of hematite and AuNCs/α-Fe 2 O 3 photoanodes using radio frequency reactive magnetron sputtering and inert gas condensation techniques, (b) HR-STEM image of the AuNCs/α-Fe 2 O 3 thin film cross-section, (c) zoom-in Au nanograin with a measured d -spacing corresponding to the (111) plane, and (c) hematite grain with the measured d -spacing corresponding to the (2–11) plane (the insets show the corresponding FFT transformations).

    Journal: Langmuir

    Article Title: Enhanced Charge Transfer Kinetics in Hematite Photoanodes via Au Nanoclusters—Toward Efficient Light-Driven Hydrogen Generation

    doi: 10.1021/acs.langmuir.4c04843

    Figure Lengend Snippet: (a) Fabrication routes of hematite and AuNCs/α-Fe 2 O 3 photoanodes using radio frequency reactive magnetron sputtering and inert gas condensation techniques, (b) HR-STEM image of the AuNCs/α-Fe 2 O 3 thin film cross-section, (c) zoom-in Au nanograin with a measured d -spacing corresponding to the (111) plane, and (c) hematite grain with the measured d -spacing corresponding to the (2–11) plane (the insets show the corresponding FFT transformations).

    Article Snippet: α-Fe 2 O 3 thin films were deposited using radio frequency magnetron sputtering (RF), and Au nanoclusters were deposited by inert gas condensation (IGC) using the commercial system by Mantis Deposition Ltd.

    Techniques:

    Structures of the taste sensor. ( a ) Pt, Ag, SnO 2 , and Au layers were deposited on an alumina substrate by RF magnetron sputtering; ( b ) the sensor device was soldered onto the printed circuit board and covered by epoxy resin except for the sensing area.

    Journal: Sensors (Basel, Switzerland)

    Article Title: Effect of Annealing Treatment on Sensing Response of Inorganic Film Taste Sensor to Sweet Substances

    doi: 10.3390/s25061859

    Figure Lengend Snippet: Structures of the taste sensor. ( a ) Pt, Ag, SnO 2 , and Au layers were deposited on an alumina substrate by RF magnetron sputtering; ( b ) the sensor device was soldered onto the printed circuit board and covered by epoxy resin except for the sensing area.

    Article Snippet: Each layer was deposited using the RF magnetron sputtering method (Canon Anelva Co., Ltd., Kanagawa, Japan: SPF-210H) under the conditions shown in .

    Techniques:

    Deposition conditions of thin films by RF magnetron sputtering.

    Journal: Sensors (Basel, Switzerland)

    Article Title: Effect of Annealing Treatment on Sensing Response of Inorganic Film Taste Sensor to Sweet Substances

    doi: 10.3390/s25061859

    Figure Lengend Snippet: Deposition conditions of thin films by RF magnetron sputtering.

    Article Snippet: Each layer was deposited using the RF magnetron sputtering method (Canon Anelva Co., Ltd., Kanagawa, Japan: SPF-210H) under the conditions shown in .

    Techniques: